Synopsys S-Litho 2025
Synopsys S-Litho 2025: The Lithography Simulation Workbench for Advanced Nodes Synopsys S-Litho 2025 is a high-performance lithography simulation and analysis tool within the Synopsys EDA ecosystem, critical for ensuring the manufacturability of integrated circuits at sub-wavelength process nodes. It enables chip designers and process engineers to predict and correct distortions that occur when nanometer-scale circuit patterns are transferred onto silicon wafers using optical lithography. Core Function: Predicting and Correcting Pattern Distortions Its primary function is to simulate the complex physics of light diffraction and resist chemistry to model the final printed pattern on a wafer. This predictive capability is the foundation for applying essential Resolution Enhancement Techniques (RET) that make leading-edge chip manufacturing possible. Key Functions: Full-Chip Lithography Simulation: Rapidly...